Laser-assisted chemical vapor deposition to directly write three-dimensional microstructures

Abstract

Application of laser-assisted chemical vapor deposition to the fabrication of three-dimensional microstructures is investigated. To fabricate a three-dimensional microstructure, a thin layer of deposit in desired patterns is first written on a flat substrate using the laser-direct-writing technique and on top of this layer a second layer is deposited to increase the height of the deposit pattern. After repeatedly depositing several layers in the same manner, a three-dimensional microstructure is fabricated. Optimum deposition conditions for direct writing of initial and subsequent layers with good surface quality and profile uniformity are determined. Using an argon ion laser and ethylene as the light source and reaction gas, respectively, fabrication of three-dimensional carbon microstructures is demonstrated. (C) 2004 Laser Institute of America.