Nanopatterned polymer thin films

Abstract

We fabricated polymer thin films with two-dimensional periodic nanopatterns using an imprinting technique with the hot embossing process. The silicon stamp employed in the imprinting has a triangular array of circular rods. The period of the array is 410 nm, and the radius and the height of a rod are 100 nm and 150 nm, respectively. The imprinting in the polymer film results in holes with the average radius of 105 nm and the average depth of 130 nm, which are close to the dimension of the stamp. The results show that the thermal imprinting process can be suitable for the implementation of nanopatterned polymer thin films. The interesting optical properties of the nanopatterned polymer thin films are also discussed.