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Nanograting Fabrication on the Surface of Silicon and Gallium Arsenide Using Femtosecond Laser Pulses

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Abstract
Self-organized nanogratings were formed with a period of sub-wavelength on the surfaces of Si and GaAs wafers by scanning a femtosecond laser beam at 800nm with appropriate irradiation conditions. The periodicity and shape of the nanogratings formed on the surfaces of two semiconductors were studied with different laser polarizations and various scan speeds. We also studied the profile and variation of the nanograting depth from the surface by atomic force microscope (AFM) analysis, and merged neighboring nanogratings to form a large area of grating structure. (C) 2011 The Japan Society of Applied Physics
Author(s)
Kim, Dae-jinKim, Tae-hongJang, Woo-youngLim, Ki-SooLee, MyeongkyuSohn, Ik-Bu
Issued Date
2011-06
Type
Article
DOI
10.1143/JJAP.50.06GG11
URI
https://scholar.gist.ac.kr/handle/local/16314
Publisher
IOP PUBLISHING LTD
Citation
Japanese Journal of Applied Physics, v.50, no.6
ISSN
0021-4922
Appears in Collections:
ETC > 1. Journal Articles
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