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Direct writing of graphite thin films by laser-assisted chemical vapor deposition

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Author(s)
Um, Jeong WookKim, So-YoungLee, Byoung HunPark, Jong BokJeong, Sungho
Type
Article
Citation
CARBON, v.169, pp.163 - 171
Issued Date
2020-11
Abstract
This study reports the direct writing of low-resistance graphite film strip of 25 mu m width and similar to 65 nm height on nickel substrates by laser-assisted chemical vapor deposition (LCVD). Raman spectra of the LCVD graphite showed no D-band, confirming that it had little defects. The G-band was nearly constant but the 2D-band showed variations in shape and intensity. A detailed analysis of the 2D-band revealed that the LCVD graphite is a mixture of highly ordered graphite and turbostratic graphite. An observation of the stacking feature by transmission electron microscope further confirmed that the layers close to substrate was closely packed, whereas the layer interspacing gradually increased with distance, transforming into turbostratic graphite. The resistivity of LCVD graphite estimated from the sheet resistance measured by the 4-point method was 2.45 x 10(-5) Omega m. (C) 2020 Elsevier Ltd. All rights reserved.
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
ISSN
0008-6223
DOI
10.1016/j.carbon.2020.07.035
URI
https://scholar.gist.ac.kr/handle/local/11894
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