GIST Scholar
College of Engineering
Department of Materials Science and Engineering
1. Journal Articles
Surface patterning of polymer-tethered nanoparticle superlattices via mask-assisted plasma etching for stimuli-responsive plasmonic modulation
- Type
- Article
- Citation
- POLYMER, v.364
- Issued Date
- 2026-10
- Abstract
- Plasmonic superlattice monolayers (SMs) hold great promise for biosensing and information encryption due to their unique localized surface plasmon resonance (LSPR) properties, yet their practical patterning remains challenging owing to the lack of facile and scalable methods. Here, we present a synergistic strategy combining mask-assisted plasma etching with in situ ligand growth to construct stimuli-responsive anti-counterfeiting patterns on two-dimensional ordered arrays of gold nanoparticles (AuNPs). By tuning the molecular weight of polystyrene ligands, the interparticle spacing is continuously adjusted from 20.1 to 34.3 nm. After 12 h of in situ polymerization, a 65 nm polyaniline (PANI) layer is selectively deposited on the etched regions, while negligible growth occurs on the unetched domains, yielding high-contrast patterning. Leveraging the reversible transitions of PANI among its emeraldine salt, leucoemeraldine, and pernigraniline states, the film exhibits excellent pHand electro-responsive performance. Upon pH switching from 2 to 12, the LSPR peak redshifts by 27 nm with full reversibility over 10 cycles, accompanied by a green-to-blue color change. The resulting patterned films exhibit tunable LSPR behavior, allowing effective encoding and concealment of information through ligand-responsive optical switching. The proposed plasma etching-based strategy offers a versatile route for surface patterning of nanoparticle superlattices. By integrating plasma etching, in situ ligand growth, and responsive polymerfunctionalized SM films, this work establishes a robust platform for secure information encryption and paves the way for advanced stimuli-responsive optical materials and devices.
- Publisher
- ELSEVIER SCI LTD
- ISSN
- 0032-3861
- Appears in Collections:
- Department of Materials Science and Engineering > 1. Journal Articles
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