국부 저압화 플라즈마 장치의 개발 및 플라즈마를 이용한 접착 강도 향상
- Author(s)
- Jihyeon Lim
- Type
- Thesis
- Degree
- Master
- Department
- 공과대학 신소재공학과
- Advisor
- Jo, Ji Young
- Abstract
- Plasma-assisted surface modification is widely recognized as an effective method for improving adhesion strength. However, conventional plasma systems face critical limitations. Low-pressure plasma systems achieve significant adhesion improvements but require prolonged pumping times, sample-size restrictions, and vacuum chambers, whereas atmospheric-pressure systems enable faster processing but exhibit limited adhesion improvements. To overcome these constraints, a Localized Low-pressure Plasma Device (LLPD) is developed, which integrates the advantages of both systems—strong plasma treatment and rapid processing. Unlike traditional low-pressure plasma systems that require placing the sample inside a sealed chamber, the LLPD enables direct plasma generation on the material surface by attaching the device externally, offering a compact, mobile, and scalable treatment configuration. The design of LLPD features localized evacuation and stable low-pressure plasma generation, achieving efficient radical formation within seconds. The production of highly reactive atomic oxygen species was confirmed using optical analysis under these conditions, which play a crucial role in surface functionalization. The performance of the LLPD was validated through plasma treatment of carbon fiber reinforced thermoplastic polymer (CFRTP), where rapid and robust adhesion enhancement was achieved within 20 seconds—comparable to the strongest reported results for conventional low-pressure plasma systems but at a fraction of the processing time. The development of LLPD establishes a new pathway for high-throughput, on-site plasma surface treatment without the need for massive vacuum chambers. LLPD thus represents a highly versatile and industrially compatible plasma source, particularly suited for large-scale structures in the aerospace and automotive industries.
- URI
- https://scholar.gist.ac.kr/handle/local/33863
- Fulltext
- http://gist.dcollection.net/common/orgView/200000944504
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