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GIST Scholar College of Information and Computing Department of Electrical Engineering and Computer Science 2. Conference Papers

Effect of Post Exposure Bake of Hydrogen Silsesquioxane on the Nanoscale Grating Pattern

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Author(s)
장재형
Type
Conference Paper
Citation
216th ECS Vienna Meeting
Publisher
BioLogic/Cambridge Nano Tech
Conference Place
AU
URI
https://scholar.gist.ac.kr/handle/local/31240
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