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GIST Repository College of Engineering Department of Materials Science and Engineering 2. Conference Papers

Ultrathin hafnium oxide with low leakage and excellent reliability for alternative gate dielectric applications

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Author(s)
이병훈
Type
Conference Paper
Citation
, pp.143 - 146
Issued Date
1999-12-01
URI
https://scholar.gist.ac.kr/handle/local/30351
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