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GIST Repository College of Information and Computing Department of Electrical Engineering and Computer Science 2. Conference Papers

Reactive Ion Etching of Thick SiO2 and Si3N4: Comparision of CF4/O2 Gas with C2F6 Gas

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Author(s)
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Type
Conference Paper
Issued Date
2000-10-01
URI
https://scholar.gist.ac.kr/handle/local/30152
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