GIST Scholar
College of Engineering
Department of Materials Science and Engineering
2. Conference Papers
Effect of High-k Post-Deposition Cleaning in Improving CMOS Bias Instabilities and Mobility: A Potential Issue in Reliability of Dual Metal Gate Techn
- Type
- Conference Paper
- Citation
- , pp.640 - 643
- Issued Date
- 2005-04-01
- Appears in Collections:
- Department of Materials Science and Engineering > 2. Conference Papers
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