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GIST Scholar College of Engineering Department of Materials Science and Engineering 2. Conference Papers

Integration of Dual Metal Gate CMOS with TaSiN and Ru Gate Electrodes on HfO2 Gate Dielectrics

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Author(s)
이병훈
Type
Conference Paper
Citation
, pp.50 - 51
Issued Date
2005-06-01
URI
https://scholar.gist.ac.kr/handle/local/28074
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