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GIST Scholar College of Engineering Department of Materials Science and Engineering 2. Conference Papers

Effects of Optimization of Gate Edge Profile on sub-45nm Metal Gate High-k Dielectric Metal-Oxide-Semiconductor Field Effect Transistors Characteristi

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Author(s)
이병훈
Type
Conference Paper
Issued Date
2006-09-01
URI
https://scholar.gist.ac.kr/handle/local/27338
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