OAK

Tetragonal Phase Stabilization by Doping as Enabler of Highly Thermally Stable HfO2 based MIM and MIS Capacitors for sub 50nm Deep Trench DRAM

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Author(s)
이병훈
Type
Conference Paper
Issued Date
2006-12-01
URI
https://scholar.gist.ac.kr/handle/local/27169
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