OAK

Full-field optical coherence tomography for polishing pad surface characterization in chemical mechanical polishing (CMP) process

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Author(s)
이병하
Type
Conference Paper
Citation
Photonics Conference 2010, pp.654 - 655
Issued Date
2010-12-03
Publisher
OSK
Conference Place
KO
현대성우리조트
URI
https://scholar.gist.ac.kr/handle/local/24577
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