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Polymer nanosphere lithography: fabrication of an ordered trigonal polymeric nanostructure

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Abstract
A combination of nanosphere lithography, sintering rheology and selective dissolution of self-assembled colloidal arrays was used to fabricate a novel trigonal polymer nanostructure whose trigonal structure became more evident after Ar+ ion etching.
Author(s)
Yi, DKKim, Dong-Yu
Issued Date
2003-04
Type
Article
DOI
10.1039/b300638g
URI
https://scholar.gist.ac.kr/handle/local/18377
Publisher
Royal Society of Chemistry
Citation
Chemical Communications, v.9, no.8, pp.982 - 983
ISSN
1359-7345
Appears in Collections:
Department of Materials Science and Engineering > 1. Journal Articles
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