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Improvement of light extraction efficiency in GaN-based light emitting diodes by random pattern of the p-GaN surface using a silica colloidal mask

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Author(s)
Park, Jeong-Woo; Park, Jeong-Ho; Koo, Hye-Yeong; Na, Seok-In; Park, Seong-Ju; Song, Ho-Young; Kim, Je Won; Kim, Woon-Chun; Kim, Dong-Yu
Type
Article
Citation
Japanese Journal of Applied Physics, v.47, no.7, pp.5327 - 5329
Issued Date
2008-07
Abstract
A two-dimensional silica colloidal particle was used to etch a p-GaN surface. By treating the p-GaN surface with polyelectrolyte (PE), mono-dispersed silica colloidal particles, 500 nm in diameter, could be uniformly distributed on a 2-in. p-GaN surface. The patterns on the p-GaN surface were produced by a plasma etching process using these colloidal particles as a mask. Etching depths of 150 and 200 run were produced on the p-GaN surface of LED samples and an increase in the Optical Output power of 46.7% was observed compared to a reference sample without patterns on the p-GaN surface.
Publisher
JAPAN SOCIETY APPLIED PHYSICS
ISSN
0021-4922
DOI
10.1143/JJAP.47.5327
URI
https://scholar.gist.ac.kr/handle/local/17342
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