Fabrication of Nanopattern by Nanoimprint Lithography for the Application to Protein Chip

Abstract

Nanoimprint lithography is an efficient and versatile method for fabricating nanosize patterned devices on account of its superior resolution, reliability and process speed compared to conventional lithography. Using this technique, microscale to nanoscale structures, called nanopore structures, were fabricated over a large area on a gold (Au) surface under mild conditions, such as room temperature and low pressure. The fabricated nanopatterns were characterized by field emission scanning electron microscopy. A protein array was fabricated on the pore shaped patterns and characterized by fluorescence microscopy. The proposed patterning process of the protein on Au substrates can be applied as potentially usable elements in the development of biosensors and other bioelectronic devices.