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Fabrication of moth-eye structure on p-GaN layer of GaN-based LEDs for improvement of light extraction

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Abstract
Moth-eye structures were produced on a p-GaN top cladding layer by UV imprint and inductively coupled plasma (ICP) etch processes in order to improve the light extraction efficiency of GaN-based green light-emitting diodes (LEDs). The height and shape of moth-eye structures were adjusted by controlling the thickness of Cr mask layer and ICP etching time. The transmittance of LED device stacks with moth-eye structure was increased up to 1.5-2.5 times, compared to identical LED sample without moth-eye structure and the intensity of photoluminescence from the InGaN multi-quantum well layer of LED sample with moth-eye structure was 5-7 times higher than that of the LED sample without the moth-eye structure. © 2009 Elsevier B.V. All rights reserved.
Author(s)
Hong, E.-J.Byeon, K.-J.Park, H.Hwang, J.Lee, H.Choi, K.Jung, Gun Young
Issued Date
2009-07
Type
Article
DOI
10.1016/j.mseb.2009.05.018
URI
https://scholar.gist.ac.kr/handle/local/17028
Publisher
ELSEVIER SCIENCE BV
Citation
Materials Science and Engineering B: Solid-State Materials for Advanced Technology, v.163, no.3, pp.170 - 173
ISSN
0921-5107
Appears in Collections:
Department of Materials Science and Engineering > 1. Journal Articles
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