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Nano-tailoring the Surface Structure for the Monolithic High-Performance Antireflection Polymer Film

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Abstract
Nano-tailoring the shape and dimensions of the parabolic antireflective structure predicted by simulation has been successfully carried out to fabricate monolithic high-performance antireflection (AR) polymer films. The average total reflectivity from an artificial antireflection film is lowered down to 0.64% at a wavelength range of 400 nm to 800 nm, which appears to be the best antireflection performance ever reported for transparent polymer antireflection films.
Author(s)
Choi, KiwoonPark, Sung HoSong, Young MinLee, Yong TakHwangbo, Chang KwonYang, HoichangLee, Han Sup
Issued Date
2010-09
Type
Article
DOI
10.1002/adma.201001678
URI
https://scholar.gist.ac.kr/handle/local/16615
Publisher
WILEY-V C H VERLAG GMBH
Citation
Advanced Materials, v.22, no.33, pp.3713 - +
ISSN
0935-9648
Appears in Collections:
Department of Electrical Engineering and Computer Science > 1. Journal Articles
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