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A high-performing nanostructured TiO2 filter for volatile organic compounds using atomic layer deposition

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Author(s)
Lee, Hye JinSeo, Hyun OokKim, Dong WunKim, Kwang-DaeLuo, YuanLim, Dong ChanJu, HyungKukKim, Jin WonLee, Jae YoungKim, Young Dok
Type
Article
Citation
Chemical Communications, v.47, no.19, pp.5605 - 5607
Issued Date
2011-05
Abstract
Novel nanostructured gas filtering systems with TiO2 thin films using atomic layer deposition (ALD) were developed for volatile organic compounds. A superior toluene adsorption efficiency was found for the nanostructured TiO2 thin films.
Publisher
Royal Society of Chemistry
ISSN
1359-7345
DOI
10.1039/c1cc10307e
URI
https://scholar.gist.ac.kr/handle/local/16341
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