GIST Scholar
College of Artificial Intelligence
Department of Electrical Engineering and Computer Science
1. Journal Articles
Highly tolerant a-Si distributed Bragg reflector fabricated by oblique angle deposition
- Type
- Article
- Citation
- Optical Materials Express, v.1, no.3, pp.451 - 457
- Issued Date
- 2011-07
- Abstract
- We demonstrate a highly tolerant and highly reflective broadband a-Si distributed Bragg reflector fabricated by oblique angle deposition. By tuning the refractive index of an a-Si film, a high index contrast material system was achieved. The highly tolerant and broadband reflective characteristics of the a-Si distributed Bragg reflector were investigated by calculation and fabrication. A broad stop band (Delta lambda/lambda = 33.7%, R>99%) with only a five-pair a-Si distributed Bragg reflector was achieved experimentally. The size-, feature- and substrate-independent method for highly reflective Bragg reflectors was realized by simple oblique angle evaporation. (C) 2011 Optical Society of America
- Publisher
- Optical Society of America
- ISSN
- 2159-3930
- Appears in Collections:
- Department of Electrical Engineering and Computer Science > 1. Journal Articles
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