Spontaneous nanoscale polymer solution patterning using solvent evaporation driven double-dewetting edge lithography

Abstract

We develop an innovative solution processable edge lithography, which we call double-dewetting edge lithography (DDEL). The polymer solution spontaneously dewets the hydrophobic regions and covers only hydrophilic regions on a surface energy-engineered substrate, which is achieved by a combination of conventional photolithography and a subsequent hydrophobic treatment of the exposed areas. Then, the secondary dewetting occurs through a coffee stain effect during the solvent evaporation, leaving polymer edge patterns behind. The whole double-dewetting phenomenon is complete within 1 s. This technique is a fast, cost-effective and easy direct solution patterning method, which enables nanoscale polymer edge patterns to be produced from various micron-scale platforms including lines, angular and irregular shapes.