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Remarkable Enhancement of Hole Transport in Top-Gated N-Type Polymer Field-Effect Transistors by a High-k Dielectric for Ambipolar Electronic Circuits

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Author(s)
Baeg, Kang-Jun; Khim, Dongyoon; Jung, Soon-Won; Kang, Minji; You, In-Kyu; Kim, Dong-Yu; Facchetti, Antonio; Noh, Yong-Young
Type
Article
Citation
ADVANCED MATERIALS, v.24, no.40, pp.5433 - 5439
Issued Date
2012-10
Abstract
A remarkable enhancement of p-channel properties is achieved in initially n-channel dominant ambipolar P(NDI2OD-T2) organic field-effect transistors (OFETs) by the use of the fluorinated high-k dielectric P(VDF-TrFE). An almost two orders of magnitude increase in hole mobility (∼0.11 cm2 V-1 s-1) originates from a strong interface modification at the semiconductor/dielectric interface, which provides high-performance complementary-like inverters and ring oscillator circuits.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
0935-9648
DOI
10.1002/adma.201201464
URI
https://scholar.gist.ac.kr/handle/local/15814
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