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Pseudomorphic thick InGaN growth with a grading interlayer by metal organic chemical vapor deposition for InGaN/GaN p-i-n solar cells

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Abstract
Thick InGaN alloys with high In content are essential for emerging InGaN photovoltaic applications. By applying a compositionally graded structure, various thicknesses of InGaN layers were grown using metal organic chemical vapor deposition. We could obtain pseudomorphic and highly strained layer even upto 100 nm of InGaN film as confirmed by X-ray reciprocal space mapping and Raman spectra. To probe the validity of those InGaN layers for solar cell applications, optical transmittance measurements were carried out and absorption properties were compared. (C) 2013 Elsevier B.V. All rights reserved.
Author(s)
Bae, Si-YoungSong, Young-HoJeon, Seong-RanKim, Dong-MinJho, Young-DahlLee, Dong-Seon
Issued Date
2014-02
Type
Article
DOI
10.1016/j.jcrysgro.2013.10.031
URI
https://scholar.gist.ac.kr/handle/local/15261
Publisher
Elsevier
Citation
Journal of Crystal Growth, v.387, pp.23 - 28
ISSN
0022-0248
Appears in Collections:
Department of Electrical Engineering and Computer Science > 1. Journal Articles
Department of Semiconductor Engineering > 1. Journal Articles
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