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Ultra-thin platinum interfacial layer assisted-photovoltaic response of transparent Pb(Zr,Ti)O-3 thin film capacitors

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Author(s)
Anoop, G.; Seo, Juhee; Han, Chang Jo; Lee, Hyeon Jun; Kim, Gil Woong; Lee, Sung Su; Park, Eun Young; Jo, Ji Young
Type
Article
Citation
Solar Energy, v.111, pp.118 - 124
Issued Date
2015-01
Abstract
For transparent solar cells, Sn:In2O3/Pb(Zr, Ti)TiO3/Pt(<= 5 nm)/Sn:In2O3 capacitor structures were fabricated using a cost-effective solution process. The insertion of ultra-thin Pt layer between the bottom Sn:In2O3 electrode and Pb(Zr, Ti)TiO3 plays a critical role in the photovoltaic characteristics of the capacitors. The Pb(Zr,Ti)O-3 capacitors with a 5 nm thick Pt layer showed excellent polarization-voltage curves with reduced leakage current due to both partial (1 1 1) orientation of Pb(Zr,Ti)O-3 and alloy formation between Pt and the Sn:In2O3 bottom electrode, as confirmed using X-ray photoelectron spectra analysis. The capacitors with a 5 nm thick Pt layer exhibit transmittance of 45-50% in the visible light region. The current density-voltage characteristics under light illumination (AM1.5G) exhibit an open circuit voltage value of -0.62 V and short circuit current density of 0.6 mu A/cm(2) after negative poling, with a maximum power conversion efficiency of 1.7 x 10(-4)%. The open circuit voltage of the capacitors with a 5 nm thick Pt layer is larger with negative poling due to the higher net internal bias arising from the Schottky barrier. (C) 2014 Elsevier Ltd. All rights reserved.
Publisher
Pergamon Press Ltd.
ISSN
0038-092X
DOI
10.1016/j.solener.2014.10.037
URI
https://scholar.gist.ac.kr/handle/local/14907
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