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Adsorption and Reaction of CO and NO on Ir(111) Under Near Ambient Pressure Conditions

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Author(s)
Ueda, K.; Suzuki, K.; Toyoshima, R.; Monya, Y.; Yoshida, M.; Isegawa, K.; Amemiya, K.; Mase, K.; Mun, Bongjin Simon; Arman, M. A.; Granas, E.; Knudsen, J.; Schnadt, J.; Kondoh, H.
Type
Article
Citation
Topics in Catalysis, v.59, no.5-7, pp.487 - 496
Issued Date
2016-03
Abstract
The adsorption and reaction of CO and NO on Ir(111) have been studied by near-ambient pressure X-ray photoelectron spectroscopy (NAP-XPS) together with low-energy electron diffraction, scanning tunneling microscopy, and mass spectroscopy (MS). Under both ultrahigh vacuum (UHV) and NAP conditions CO molecules occupy on-top sites of the Ir(111) surface at room temperature (RT) by forming two-dimensional clusters. Exposure to NO under UHV conditions at RT induces partially dissociative adsorption, while NAP NO exposure leads to a Ir(111) surface that is covered by molecular NO. We conducted in-operando NAP-XPS/MS observation of the NO + (CO)-C-13 reaction under a NAP condition as a function of temperature. Below 210 degrees C adsorption of NO is inhibited by CO, while above 210 degrees C the CO inhibition is released due to partial desorption of CO and dissociative adsorption of NO starts to occur leading to associative formation of N-2. Under the most active condition studied here the Ir surface is covered by a dense co-adsorption layer consisting of on-top CO, atomic N and O, which suggests that this reaction is not a NO-dissociation-limited process but a N-2/CO2 formation-limited process.
Publisher
Baltzer Science Publishers B.V.
ISSN
1022-5528
DOI
10.1007/s11244-015-0523-5
URI
https://scholar.gist.ac.kr/handle/local/14323
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