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Detailed analysis and performance limiting mechanism of Si delta-doped GaAs tunnel diode grown by MBE

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Abstract
High-performance GaAs tunnel diodes (TDs) are fabricated by using Si delta-doping technique. The GaAs TDs exhibited a high peak tunnel-current density of 2,735 A/cm(2) and low specific resistivity of 1.46 x 10(-4) Omega.cm(2). However, the performance of the GaAs TDs deteriorated once the amount of Si delta doping exceeded a certain limit, which has been rarely reported elsewhere. Detailed analyses and numerical simulations of GaAs TDs with various amounts of Si delta doping prove that Si amphoteric behavior governs the performance limit. GaAs TDs with precisely controlled Si delta doping are suitable for cutting-edge tandem solar cell applications. (C) 2018 The Japan Society of Applied Physics
Author(s)
Kang, SeokjinJu, Gun WuMin, Jung-WookLee, Dong-SeonLee, Yong TakKim, Hyo JinPark, Kwangwook
Issued Date
2018-12
Type
Article
DOI
10.7567/JJAP.57.120306
URI
https://scholar.gist.ac.kr/handle/local/12984
Publisher
Institute of Physics Publishing
Citation
Japanese Journal of Applied Physics, v.57, no.12
ISSN
0021-4922
Appears in Collections:
Department of Electrical Engineering and Computer Science > 1. Journal Articles
Department of Semiconductor Engineering > 1. Journal Articles
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