Roles of a strain relaxation and an oxygen vacancy on nanoscale inhomogeneities in VO2 thin film
- Abstract
- We investigated structural and electronic inhomogeneities in a VO2 thin film grown on a (001)-oriented TiO2 substrate by exploiting nano-scale and macroscopic probing techniques. A compressive strain along the out-of-plane direction becomes additionally relaxed via microcracks which form a micron-sized rectangular pattern. A large inhomogeneity in the dielectric response is observed near the crack, and this signifies a strong coupling between electronic and lattice degrees of freedom. Interestingly, the strong inhomogeneity is observed also inside of the rectangular pattern, and it shows a gradient along one crystalline axis. We attribute such peculiar inhomogeneity observed in a relatively large length scale possibly to a combined effect of the strain relaxation and an oxygen vacancy distribution. As the nano-scale inhomogeneities in structural and electronic properties will eventually determine macroscopic responsivities, this work can be a good guide in designing VO2 thin films with appropriate controls of the strain and the chemical composition to realize better functionalities.
- Author(s)
- Kim, M.S.; Park, S.H.; Choi, S.; Kim, J.; Lee, K.H.; Noh, S.Y.; Chae, B.N.; Lee, S.; Kim, Bong-Joong; Lee, Jong Seok
- Issued Date
- 2023-02
- Type
- Article
- DOI
- 10.1016/j.cap.2022.11.012
- URI
- https://scholar.gist.ac.kr/handle/local/10389
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