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Roles of a strain relaxation and an oxygen vacancy on nanoscale inhomogeneities in VO2 thin film

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Author(s)
Kim, M.S.Park, S.H.Choi, S.Kim, J.Lee, K.H.Noh, S.Y.Chae, B.N.Lee, S.Kim, Bong-JoongLee, Jong Seok
Type
Article
Citation
Current Applied Physics, v.46, pp.40 - 45
Issued Date
2023-02
Abstract
We investigated structural and electronic inhomogeneities in a VO2 thin film grown on a (001)-oriented TiO2 substrate by exploiting nano-scale and macroscopic probing techniques. A compressive strain along the out-of-plane direction becomes additionally relaxed via microcracks which form a micron-sized rectangular pattern. A large inhomogeneity in the dielectric response is observed near the crack, and this signifies a strong coupling between electronic and lattice degrees of freedom. Interestingly, the strong inhomogeneity is observed also inside of the rectangular pattern, and it shows a gradient along one crystalline axis. We attribute such peculiar inhomogeneity observed in a relatively large length scale possibly to a combined effect of the strain relaxation and an oxygen vacancy distribution. As the nano-scale inhomogeneities in structural and electronic properties will eventually determine macroscopic responsivities, this work can be a good guide in designing VO2 thin films with appropriate controls of the strain and the chemical composition to realize better functionalities.
Publisher
Elsevier
ISSN
1567-1739
DOI
10.1016/j.cap.2022.11.012
URI
https://scholar.gist.ac.kr/handle/local/10389
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