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1 Article Etchant-Free Dry-Developable Extreme Ultraviolet Photoresist Materials Utilizing N-Heterocyclic Carbene–Metal Complexes Kim, Dowon ; Byeon, Jinhwan ; Ahn, Jaeboong ; et al 2025-02
2 Article Patterning of metal acetylacetonate complex via extreme-ultraviolet light-induced chemical reaction and straightforward thermal development process Byeon, Jinhwan ; Kim, Dowon ; Kim, Sangjin ; et al 2025-01

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